Scientific Journals




 

 

 

60. "Comparative study of plasma-deposited fluorocarbon coatings on different substrates",

J. Phys. D - Appl. Phys., 44 (2011) 194007 

E. Farsari, M. Kostopoulou, E. Amanatides, D. Mataras, D.E. Rapakoulias © 

 


 

 

59. "Simulation of cylindrical electron cyclotron wave resonance argon discharges", 

J. Phys. D - Appl. Phys., 44 (2011) 165204

S. Sfikas, E. Amanatides, D. Mataras, D.E. Rapakoulias © 

 


 

 

58. "Growth kinetics of plasma deposited microcrystalline silicon thin films",

Surf. Coat. Technol., Article in press - Available online,

E. Amanatides and D. Mataras ©

 


 

 

57. "Immobilization of liposomes on plasma-functionalized metal surfaces",

Colloids and Surfaces B: Biointerfaces, 84 (2011) 214 S.

Mourtas et al.©

 

 


 

 56. "Staphylococcus epidermidis Adhesion to He, He/O2 Plasma Treated PET Films and Aged Materials: Contributions of Surface Free Energy and Shear Rate

Colloids and Surfaces B: Biointerfaces, 65 (2008) 257-268     

Maria G. Katsikogianni, Christos S. Syndrevelis, Eleftherios K. Amanatides, Dimitrios S. Mataras, Yannis F. Missirlis © 

 

 


 

 

55. "Substrate holder biasing for improvement of microcrystalline silicon deposition process"

Journal of Non-Crystalline Solids 354 (2008) 2208–2213

X.D. Zhang, F.R. Zhang, E. Amanatides, D. Mataras, S.Z. Xiong and Y. Zhao©

 

 


 

 

 54. "Modeling and experiments of high-pressure VHF SiH4/H2 discharges for higher microcrystalline silicon deposition rate"

Thin Solid Films 516 (2008) 6829–6833 

X.D. Zhang, F.R. Zhang, E. Amanatides, D. Mataras and Y. Zhao ©  

 

 


 

 

53. "Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films"

Thin Solid Films 516 (2008) 6912–6918 

X.D. Zhang, F.R. Zhang, E. Amanatides, D. Mataras and Y. Zhao ©  

 

 


 

 

52. "Fluid Model of an Electron Cyclotron Wave Resonance Discharge” 

IEEE Trans. Plasma Science 10.1109/TPS.2007.905946 Page(s): 1420-1425 (2007)

S. A. Sfikas, E. K. Amanatides, D. S. Mataras, D. E. Rapakoulias © 

 

 


 

 

51. "Plasma Treated and a-C:H Coated PET Performance in Inhibiting Bacterial Adhesion”,

Plasma Processes and Polymers,4, Issue S1, Pages: S1046-S1051 (2007)

Maria G. Katsikogianni, Christos S. Syndrevelis, Eleftherios K. Amanatides, Dimitrios S. Mataras, Yannis F. Missirlis ©

 

 


 

 

50. "Improved Surface Energy Analysis for Plasma Treated PET Films

Plasma Processes and Polymers, Volume 4, Issue S1, Pages: S1057-S1062 (2007)

Daphne Papakonstantinou, Eleftherios Amanatides, Dimitrios Mataras, Vasilis Ioannidis, Panagiotis Nikolopoulos©

 


 

 

49. “Simulation of The Electrical Poperties of SiH4/H2 RF Discharges

Jap. J. Appl. Phys. 45 (2006) 8172-8176 © 

B. Lyka, E. Amanatides and D. Mataras

 


 

 

48. "Relative importance of hydrogen atom flux and ion bombardment to the growth of μc-Si:H thin films"

B. Lyka, E. Amanatides and D. Mataras

Journal of Non-Crystalline Solids, 352 1049 2006 ©

 


 

47. "Plasma 2D modeling and diagnostics of DLC deposition on PET"

E. Amanatides, P. Gkotsis, Ch. Syndrevelis and D. Mataras

Diamond and Related Materials, 15 904 (2006) ©

 

 


 

 

46. "Effect of plasma parameters on the amorphous to microcrystalline silicon transition"

E. Katsia, E. Amanatides, D. Mataras and D.E. Rapakoulias

Thin Solid Films, 511-512 285 (2006) ©

 


 

 

45. "Temperature effect and stress on microcrystalline silicon thin films deposited under high pressure plasma conditions"

E. Amanatides, E. Katsia, D. Mataras, A. Soto and G.A. Voyiatzis

Thin Solid Films 511-512 603 (2006) ©

 


 

 

44. "RF power and SiOxCyHz deposition efficiency in TEOS/O2 discharges for the corrosion protection of magnesium alloys"

Ch. Voulgaris, E. Amanatides, D. Mataras, S. Grassini, E. Angelini and F. Rosalbino

Surf. Coat. Technol. 200, 6618 (2006) ©

 


 

 

43. "Plasma surface treatment of polyethylene terephthalate films for bacterial repellence"

E. Amanatides, D. Mataras, M. Katsikogianni and Y.F. Missirlis

Surf. Coat. Technol. 200, 6331 (2006) ©

 


 

 

42. "RF power effect on TEOS/O2 PECVD of silicon oxide thin films"

Ch. Voulgaris, A. Panou, E. Amanatides, D. Mataras

Surf. Coat. Technol. 200, 351 (2005) ©

 


 

41. "TEOS/O2 gas pressure as a chemical composition adjuster of plasma deposited SiO2 thin films"

A. Panou, Ch. Voulgaris, E. Amanatides, D. Mataras, D. E. Rapakoulias

High Temp. Mat. P 9, 279 (2005)

 


 

40. "Plasma emission diagnostics for the transition from microcrystalline to amorphous silicon solar cells"

E. Amanatides, D. Mataras, D. E. Rapakoulias, M. N. van den Donker, B. Rech

Sol. Energy Mater. Sol. Cells. 87, 795 (2005) ©

 


 

 

39. "Total SiH4/H2 Pressure Effect on Microcrystalline Silicon Thin Films Growth and Structure"

E. Katsia, E. Amanatides, D. Mataras, Α. Soto, G.A. Voyiatzis

Sol. Energy Mater. Sol. Cells. 87, 157 (2005) ©

 


 

 

38. "Electrical and optical properties of CH4/H2 RF plasmas for diamond-like thin film deposition"

E. Amanatides, D. Mataras

Diamond Relat. Mater. 14, 292 (2005) ©

 


 

37. "Plasma Enhanced Chemical Vapor Deposition of Silicon under Relatively High Pressure Conditions

E. Amanatides, B. Lykas and D. Mataras

IEEE Trans. Plasma Sci. 33, 372 (2005)

 


 

 

36. "On the high pressure regime of plasma enhanced deposition of microcrystalline silicon"

E. Amanatides, A. Hammad, E. Katsia, D. Mataras

J. Appl. Phys. 97, 073303 (2005)©

 


 

 

35. "Exploration of the deposition limits of microcrystalline Silicon

D. Mataras

Pure Appl. Chem. 77, 379©

 


 

 

34. "Power consumption effect on the microcrystalline silicon deposition process: a comparison between model and experimental results"

B. Lykas, E. Amanatides, D. Mataras, D. E. Rapakoulias

J. Phys.: Conf. Ser. 10 (2005) 198-201 ©

 


 

 

33. "Interelectrode space effect on power dissipation and silicon oxide thin film growth from TEOS/O2 discharges

A. Panou, E. Amanatides, D. Mataras, D. E. Rapakoulias

J. Phys.: Conf. Ser. 10 (2005) 202-205 ©

 


 

 

32. "On the effect of the substrate pretreatment parameters on the composition and structure of plasma deposited SiO2 thin films

Ch. Voulgaris, E. Amanatides, D. Mataras, D. E. Rapakoulias

J. Phys.: Conf. Ser. 10 (2005) 206-209 ©

 


 

 

31. "PECVD of hydrogenated silicon thin films from SiH4+H2+Si2H6 mixtures"

  A. Hammad, E. Amanatides, D. Mataras and D. E. Rapakoulias

Thin Solid Films 451-452, 255 (2004)©

 


 

 

30. "The combined effect of electrode gap and radio frequency on power deposition and film growth kinetics in SiH4/H2 discharges"

E. Amanatides, D. Mataras, D. E. Rapakoulias

J. Vac. Sci. Technol. A 20, 68 (2002) ©

 


 

 

29. "On the effect of frequency in the deposition of microcrystalline silicon from silane discharges

  E. Amanatides, D. Mataras, D. E. Rapakoulias

J. Appl. Phys. 90, 5799 (2001) ©

 


 

 

28. "Gas-phase and surface kinetics in Plasma Enhanced Chemical Vapor Deposition of microcrystalline silicon

E. Amanatides, S. Stamou, D. Mataras

J. Appl. Phys. 90, 5786 (2001) ©

 


 

 

27. "Treatment of Polyethylene Terephthalate in a Helium glow-discharge"

  D-D. Papakonstantinou, D. Mataras

J. Phys. IV. 11, Pr3-357 (2001) ©

 


 

 

26. "Electron impact silane dissociation and deposition rate relationship in the Plasma Enhanced Chemical Vapour Deposition of microcrystalline silicon thin films"

E. Amanatides, D. E. Rapakoulias, D.  Mataras

 J. Phys. IV. 11, Pr3-715 (2001) ©

 


 

 

25. "Effect of double-layer formation on the deposition of microcrystalline silicon films in hydrogen diluted silane discharges

A. Hammad, E. Amanatides, D. E. Rapakoulias, D. Mataras 

J. Phys. IV. 11, Pr3-779 (2001) ©

 


 

 

24. "Frequency variation under constant power conditions in hydrogen radio frequency discharges"

  E. Amanatides and D. Mataras 

J. Appl. Phys. 89, 1556 (2001) ©

 


 

 

23. "Deposition rate optimization in SiH4/H2 PECVD of hydrogenated microcrystalline silicon"

E. Amanatides, D. Mataras, D. E. Rapakoulias

Thin Solid Films 383, 15 (2001) ©

 


 

 

22. "Effect of interelectrode space on properties of SiH4/H2 deposition discharges operating at different radio frequencies

E. Amanatides, D. Mataras and D. E. Rapakoulias 

High Temp. Mat. P 4, 563©

 


 

 

21. "About rotational temperature measurements and thermodynamic equilibrium in rf glow-discharges

S. Stamou, D. Mataras, D. E. Rapakoulias

High Temp. Mat. P 3, 39 (1999) ©

 


 

 

20. "Spatial distribution of optical emission in silane/hydrogen rf discharges

S. Stamou, E. Amanatides, D. Mataras

High Temp. Mat. P 3, 255 (1999) ©

 


 

 

19. "Spatial rotational temperature and emission intensity profiles in silane plasmas

S. Stamou, D. Mataras, D. E. Rapakoulias

J. Phys. D: Appl. Phys. 31, 2513 (1998) ©

 


 

 

18. "Improvements in control and understanding of radio frequency silane discharges"

D. Mataras, D. E. Rapakoulias

High Temp. Mat. P 1, 383-391 (1997) ©

 


 

 

17. "Arrhenious like behavior in plasma reactions

N. Spiliopoulos, D. Mataras, D. E. Rapakoulias

Appl. Phys. Lett. 71, 605 (1997) ©

 


 

 

16. "Influence of discharge geometry on power dissipation and sheath impedances in silane discharges"

  N. Spiliopoulos, D. Mataras, D. E. Rapakoulias

Jap. J. Appl. Phys. 36, 66 (1997) ©

 


 

 

15. "Simulation of the SiH (A2Δ- Χ2Π) emission spectrum in a silane glow discharge and derivation of an improved set of molecular constants"

S. Stamou, D. Mataras, D. E. Rapakoulias

Chemical Physics 218, 57 (1997) ©

 


 

 

14. "Kinetics of power deposition and silane dissociation in radio frequency discharges"

  N. Spiliopoulos, D. Mataras, D. E. Rapakoulias

J. Electrochem. Soc. 144, 634 (1997) ©

 


 

 

13. "Effective capture rates of carriers in amorphous hydrogenated silicon"

  P. Kounavis, D. Mataras, D. E. Rapakoulias  

J. Appl.Phys. 80, 2305 (1996) ©

 


 

 

12. "Power dissipation and impedance measurements in radio frequency discharges"

  N. Spiliopoulos, D. Mataras, D. E. Rapakoulias

J. Vac. Sci. Technol. A 14, 2757 (1996) ©

 


 

 

11. "Dilution enhanced radical generation in Silane Glow Discharges"

  D. Mataras, F. Coutelieris, P. Kounavis, D.E. Rapakoulias

J. Phys. D: Appl. Phys. 29, 2452 (1996) ©

 


 

 

10. "Influence of plasma conditions on the defect formation mechanism in amorphous hydrogenated silicon"

  P. Kounavis, D. Mataras, N. Spiliopoulos, E. Mytilineou and D. Rapakoulias 

J. Appl. Phys. 75, 1599 (1994) ©

 


 

 

09. "Heterogeneous catalysis in interaction of plasma excited species with surfaces

D. E. Rapakoulias, S. Cavadias, and D. Mataras

High Temp. Chem. P 2, 231 (1993) ©

 


 

 

08. "Power dissipation mechanisms in rf driven silane discharges, the influence of discharge geometry"

  D. Mataras, S. Cavadias, D. Rapakoulias

J. Vac. Sci. Technol. 11,664 (1993) ©

 


 

 

07. "Chemical reactors in plasma environment. A new route in chemistry"

  D. E. Rapakoulias and D. S. Mataras

High Temp. Chem. P 1, 485 (1992) ©

 


 

 

06. "Plasma Enhanced CVD of amorphous hydrogenated silicon investigated by optical diagnostics"

   D. Mataras, and D. E. Rapakoulias

Materials and Manufacturing Processes 7, 561 (1992) ©

 


 

 

05. "Nitrogen ion dynamics in low-pressure nitrogen plasma and plasma sheath"

  D. E. Gerassimou, S. Cavadias, D Mataras and D. E. Rapakoulias 

J. Appl. Phys. 67, 146 (1990) ©

 


 

 

04. "Spatial generation profiles of active radicals in plasma-enhanced CVD of a-Si:H".

  D. Mataras, S. Cavadias, D. Rapakoulias 

Mat. Res. Symp. Proc. 165, 55 (1990) ©

 


 

 

03. "Spatial profiles of reactive intermediates in rf silane discharges"

D. Mataras, S. Cavadias, D. Rapakoulias

J. Appl. Phys. 66, 119 (1989) ©

 


 

 

02. "Modelisation du Transfert d' Energie entre un Plasma Hors d'Equilibre Moleculaire (N2) ou Atomique (Ar) et une Surface Metallique (W)"

D. E. Rapakoulias, D. E. Gerassimou, S. N. Cavadias

Rev. Int. Hautes Temper. et Refract. Fr. 24, 105 (1987)

 


 

 

01. "Simulation of energy transfer from a glow discharge to a solid surface"

D. E. Rapakoulias, D. E. Gerassimou

J. Appl. Phys. 62, 402 (1987) ©

 


 


 

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