Research Areas

The research in PTL_UP aims at the development of plasma processes and equipment through understanding of the elementary process mechanisms. The strategy followed for the development of each process-material-application set is based on the use of -many unique- plasma diagnostic techniques that are then combined with plasma-CFD modeling and correlated with material characterization techniques for achieving optimized material properties and yield.

Some of the targeted materials/applications are:

-Intrinsic and Doped (a-Si:H, μC-Si:H) thin-films for

- Large Area Photovoltaics

- Thin-Film Transistors (TFT’s)

- Optoelectronic Sensors

- SiO_x thin films for

- Highly Resistive Coatings

- Barrier and Protective Coatings

- DLC coatings

- Modification of surface properties (wetability, adhesion, Biocompatibility etc)

- Deposition of PolyAcrylic Acid films (Bio-Functionalisation)

- Deposition of hydrophobic and hydrophylic coatings (CFx, TiOx, PEO-like)

- Applications of Atmospheric Pressure Plasmas (Surface Treatment, Plasma Medicine

- Design and Testing of RF Capacitive and High Density (Inductive, ECWR, Hollow Cathode) Plasma Sources