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Plasma Technology Laboratory (PTLUP) is a Research Laboratory in the Department of Chemical Engineering (DCEUP), University of Patras (UP), Greece.


PTLUP was founded in 1985 and since then it has been involved in research and education activities in the fields of Plasma Processing for the deposition of Thin-Films, Surface Treatment and Functionalization.


Plasma Processing is one of the most rapidly developing advanced technology fields dealing with the production and/or functionalization of new or enhanced materials for a wide range of high tech applications ranging from Microelectronics to Nanotechnology and MicroElectro Mechanics.

Our involvement in Plasma Processing covers both fundamental and technological aspects ranging from, plasma physics and chemistry to industrial plasma reactors design. Through the many research projects we have participated in, substantial expertise was gained specifically in the areas of plasma diagnostics and plasma modelling for the PE-CVD of various thin films among which thin film silicon for photovoltaic applications, either amorphous or microcrystalline (α–Si:H, μC-Si:H),  holds a central position.

The methods initially developed for thin-film silicon were further exploited in a wide range of materials (SiOx, DLC, CFx, PDAA etc) and processes for a variety of applications (protective layers, wettability, biocompatibility, surface functionalization, plasma medicine etc). For further information please refer to the relevant sections of this website or This email address is being protected from spambots. You need JavaScript enabled to view it. .


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