Self-Consistent

Up Electrical Modeling Mass Transfer Model Self-Consistent

 

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Plasma Modeling:
Self - Consistent Fluid and hybrid Models in
PTLUP

 

Plasma Technology Laboratory has been involved to the development of  self-consistent fluid and hybrid models since 2001. The self-consistent approach is required in order to simulate plasma reactors were typical plasma diagnostics measurements cannot be applied as medium and industrial scaled systems.

Such types of models require a minimum number of inputs and counts for all physical and chemical processes that take place during the Plasma Processing of materials. PTLup model involves the following modules   

Flow module
Equations:  Navier –Stokes
Results:      Flow field – Gas velocity – Gas density distribution
Time:          Slow step ~ 1-2 sec

 

Heat module
 Equations:  Heat conduction - convection – diffusion – radiation
 Results:      Temperature and gas enthalpy maps
 Time:          Slow step ~ 1-2 sec

 

Chemistry module
 Equations:  Mass balance of species
 Results:      Reactions rate, species density distribution, species flux towards surfaces
 Time:          Intermediate step ~ 1 – 300 msec

 

Plasma Module
 Equations:  Mass balance of electrons and ions, Energy balance of electrons and ions
 Results:      Electrons and ions density distribution, ions flux towards surfaces, electron –  molecule collision rates
 Time:          Fast step ~ 1-10 μsec

 

Electromagnetic module
Equations:  Poisson’s equation
 Results:      Distribution of electrostatic field and voltage
 Time:          Fast step ~ 1-10 μsec
 

The main problem of such type of simulation is the large scattering of time scales that are required for the convergence of the different modules and the extensive in some cases gas phase and surface chemistry of the processes. Advanced numerical algorithms are necessary for fast convergence while High Performance Computing systems and parallel processing are required especially in the case of industrial systems

 

PTLUP has already develop and use self-consistent model for the simulation of

bulletAmorphous and microcrystalline silicon deposition from SiH4/H2 plasmas
bulletDiamond-like thin film deposition from CH4/H2 discharges
bulletTreatment of polymers from He and He/O2 discharges

Check here for some characteristic results and a presentation of the model!

 

Typical steps that are required for the simulation of the plasma process are:

bulletGeometry creation and meshing
bulletProblem solution
bulletPost - Processing of the data

Hit the links to see more information on these steps!